Nucleation and control of departure of a high-field domain by a gate electrode |
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Authors: | Hashizume N. Kawashima M. Kataoka S. |
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Affiliation: | Ministry of International Trade & Industry, Electrotechnical Laboratory, Tokyo, Japan; |
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Abstract: | Experimental results are given which show that, in a m.i.s.f.e.t. type GaAs bulk device, a negative voltage applied to the gate electrode can nucleate a high-field domain under the gate electrode, but that its subsequent departure for the anode is allowed or inhibited depending on the device structure and operating conditions. |
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