Behaviour of a tall vertical gas-evolving cell. Part I: Distribution of void fraction and of ohmic resistance

Electrolysis of a 22 wt % NaOH solution has been carried out in a vertical tall rectangular cell with two segmented electrodes. The ohmic resistance of the solution between a segment pair has been determined as a function of a number of parameters, such as, current density and volumetric rate of liquid flow. It has been found that the ohmic resistance of the solution during the electrolysis increases almost linearly with increasing height in the cell. Moreover, a relation has been presented describing the voidage in the solution as a function of the distance from the electrodes and the height in the cell.Notation A _e electrode surface area (m²) - a _s parameter in Equation 12 (A^–1) - b _s parameter in Equation 12 - d distance (m) - d _ac distance between the anode and the cathode (m) - d _wm distance between the working electrode and an imaginary separator (m) - F Faraday constant (C mol^–1) - h height from the leading edge of the working electrode corresponding to height in the cell (m) - h _e distance from the bottom to the top of the working electrode (m) - h _s height of a segment of working electrode (m) - I current (A) - I ₂₀ current for segment pair 20 (A) - I _1–19 total current for the segment pairs from 1 to 19 inclusive (A) - I _x-19 total current for the segment pairs fromx to 19 inclusive (A) - i current density A m^–2 - N _s total number of gas-evolving pairs - n ₁ constant parameter in Equation 8 - n _a number of electrons involved in the anodic reaction - n _c number of electrons involved in the cathodic reaction - n _s number of a pair of segments of the segmented electrodes from their leading edges - Q _g volumetric rate of gas saturated with water vapour (m³ s^–1) - Q ₁ volumetric rate of liquid (m³ s^–1) - R resistance of solution () - R ₂₀ resistance of solution between the top segments of the working and the counter electrode () - R _p resistance of bubble-free solution () - R _p,20 R _p for segment pair 20 () - r _s reduced specific surface resistivity - r _s,0 r _s ath=0 - r _s,20 r _s for segment pair 20 - r _s, r _s for uniform distribution of bubbles between both the segments of a pair - r _s,,20 r _s, for segment pair 20 - S _b bubble-slip ratio - S _b,20 S _b at segment pair 20 - S _b,h S _b at heighh in the cell - T temperature (K) - V _m volume of 1 mol gas saturated with water vapor (m³ mol^–1) - v ₁ linear velocity of liquid (m s^–1) - v _1,0 v ₁ through interelectrode gap at the leading edges of both electrodes (m s^–1) - W _e width of electrode (m) - X distance from the electrode surface (m) - Z impedance () - Z real part of impedance () - Z imaginary part of impedance () - resistivity of solution ( m) - _p resistivity of bubble-free solution ( m) - gas volumetric flow ratio - ₂₀ at segment pair 20 - _s specific surface resistivity ( m²) - _{s, p s} for bubble-free solution ( m²) - thickness of Nernst bubble layer (m) - ₀ ath=0 (m) - voidage - _x,0 atx andh=0 - _0,0 voidage at the leading edge of electrode wherex=0 andh=0 - _,h voidage in bulk of solution at heighth - ₂₀ voidage in bubble of solution at the leading edge of segment pair 20