ZnO/Cu/ZnO multilayer films: Structure optimization and investigation on photoelectric properties |
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Authors: | Xiao-Yu Liu Ying-Ai LiShi Liu Hong-Lin Wu Hai-Ning Cui |
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Affiliation: | a Key Laboratory of Coherent Light and Atom/Molecule Spectra under Ministry of Education, College of Physics, Jilin University, Changchun 130012, PR Chinab College of Zhaoqing, Zhaoqing 526061, PR Chinac State Key Laboratory of Superhard Materials, Jilin University, ChangChun 130012, PR Chinad Department of Physics, College of Sciences, Harbin Institute of Technology, Harbin 150001, PR China |
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Abstract: | A series of ZnO/Cu/ZnO multilayer films has been fabricated from zinc and copper metallic targets by simultaneous RF and DC magnetron sputtering. Numerical simulation of the optical properties of the multilayer films has been carried out in order to guide the experimental work. The influences of the ZnO and Cu layer thicknesses, and of O2/Ar ratio on the photoelectric and structural properties of the films were investigated. The optical and electrical properties of the multilayers were studied by optical spectrometry and four point probe measurements, respectively. The structural properties were investigated using X-ray diffraction. The performance of the multilayers as transparent conducting coatings was compared using a figure of merit. In experiments, the thickness of the ZnO layers was varied between 4 and 70 nm and those of Cu were between 8 and 37 nm. The O2/Ar ratios range from 1:5 to 2:1. Low sheet resistance and high transmittance were obtained when the film was prepared using an O2/Ar ratio of 1:4 and a thickness of ZnO (60 nm)/Cu (15 nm)/ZnO (60 nm). |
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Keywords: | Zinc oxide Copper Multilayer Oxygen gas Optical properties Electrical properties X-ray diffraction Sputtering |
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