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Fabrication of biomimic GaAs subwavelength grating structures for broadband and angular-independent antireflection
Authors:Xi Chen  Zhong-Chao FanYun Xu  Guo-Feng SongLiang-Hui Chen
Affiliation:a Nano-optoelectronics Lab, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
b Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
Abstract:We combine interferometric lithography and inductively coupled plasma etching to fabricate GaAs subwavelength grating (SWG) which mimics the moth eye structures. Through the modification of morphology parameters, including profile, height and packing fraction, tapered, high-aspect-ratio and closely-packed GaAs SWGs are obtained. The measurement of spectral reflectance of the fabricated SWGs shows that reflection has been dramatically reduced compared to the polished GaAs surface. Particularly, the optimized SWG structures exhibit an average reflection below 5% in the wavelengths ranging from 350 to 900 nm. Furthermore, the angular-independent property is demonstrated by measuring the reflectance versus varying angles of incidence at 532 and 632.8 nm wavelengths.
Keywords:Subwavelength gratings  Broadband antireflection  Interferometric lithography  Moth eye
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