Fabrication and characterization of bilayer metal wire-grid polarizer using nanoimprint lithography on flexible plastic substrate |
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Authors: | Fantao Meng Gang LuoIvan Maximov Lars MonteliusJinkui Chu Hongqi Xu |
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Affiliation: | a Division of Solid State Physics, Lund University, Box 118, S-22100 Lund, Sweden b The Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, 116024 Dalian, China |
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Abstract: | In this work, we demonstrate the fabrication of bilayer metal wire-grid polarizers and the characterization of their performance. The polarizers with 200 nm period were fabricated on flexible plastic substrates by nanoimprint lithography (NIL), followed by aluminum deposition. Transmission efficiency over 0.51 and extinction ratio higher than 950 can be achieved in the visible range when the aluminum thickness of the polarizer is 100 nm. The fabrication process only involves direct imprinting on flexible plastic substrates and aluminum deposition, without any resist spin-coating, lift-off, and etching processes, which is much simpler, less costly, and applicable to large volume production. |
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Keywords: | Bilayer wire-grid polarizer Nanoimprint lithography Flexible plastic substrate TM transmission Extinction ratio |
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