Pattern transfer of nano-scale ferroelectric PZT gratings by a reversal nanoimprint lithography |
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Authors: | Zhi-Dong LiZhen-Kui Shen Wen-Yuan HuiZhi-Jun Qiu Xin-Ping QuYi-Fang Chen Ran Liu |
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Affiliation: | a State Key Lab of Asic and System, Department of Microelectronics, Fudan University, Shanghai 200433, China b Rutherford Appleton Laboratory, STFC, Chilton, Didcot, Oxon OX11 0QX, UK |
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Abstract: | Nanoscale PZT gratings are successfully transferred to a Pt substrate using reversal nanoimprint technique without any chemical etch processes. The transfer process is preliminarily studied by measuring the surface topography of PZT coated on templates before transferring as well as the transferred patterns on substrates. Piezoelectric force microscopy (PFM) and Raman spectroscopy are used to investigate the transferred PZT nanostructures after annealing. Good ferroelectric and structural properties have been demonstrated by the transferred PZT nanostructures, indicating that this reversal imprint technique is applicable for forming nanoscale PZT domains, which may lead to the manufactures of high density data storage devices at economic cost. |
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Keywords: | Reversal nanoimprint lithography Ferroelectric PZT PFM |
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