首页 | 本学科首页   官方微博 | 高级检索  
     


Patterning of pyramidal recesses in (1 0 0)InP substrate
Authors:P Eliáš  I Kosti?J Šoltýs
Affiliation:a Institute of Electrical Engineering, Slovak Academy of Sciences, Dúbravská cesta 9, 841 04 Bratislava, Slovak Republic
b Institute of Informatics, Slovak Academy of Sciences, Dúbravská cesta 9, 845 07 Bratislava, Slovak Republic
Abstract:
Keywords:Inverted pyramids  InP  Wet-etching
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号