X-ray absorption near edge structure investigation of vanadium-doped ZnO thin films |
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Authors: | M. Faiz B.S. Mun |
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Affiliation: | a Surface Science Laboratory, Physics Department, KFUPM, Dhahran, Saudi Arabia b Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA |
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Abstract: | X-ray absorption near edge structure spectroscopy has been used to investigate the electronic and atomic structure of vanadium-doped ZnO thin films obtained by reactive plasma. The results show no sign of metallic clustering of V atoms, +4 oxidation state of V, 4-fold coordination of Zn in the films, and a secondary phase (possibly VO2) formation at 15% V doping. O K edge spectra show V 3d-O 2p and Zn 4d-O 2p hybridization, and suggest that V4+ acts as electron donor that fills the σ* band. |
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Keywords: | ZnO XANES Vanadium doping Thin films DC-sputtering |
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