Controlled density of vertically aligned carbon nanotubes in a triode plasma chemical vapor deposition system |
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Authors: | Sung Hoon Lim Jong Hyun Moon Didier Pribat Jin Jang |
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Affiliation: | a Advanced Display Research Center, Kyung Hee University, Seoul 130-701, South Korea b Laboratoire de Physique des Interfaces et des Couches Minces, Ecole Polytechnique, 91128, Palaiseau Cedex, France |
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Abstract: | We report on the growth mechanism and density control of vertically aligned carbon nanotubes using a triode plasma enhanced chemical vapor deposition system. The deposition reactor was designed in order to allow the intermediate mesh electrode to be biased independently from the ground and power electrodes. The CNTs grown with a mesh bias of + 300 V show a density of ∼ 1.5 μm− 2 and a height of ∼ 5 μm. However, CNTs do not grow when the mesh electrode is biased to − 300 V. The growth of CNTs can be controlled by the mesh electrode bias which in turn controls the plasma density and ion flux on the sample. |
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Keywords: | 85.40.Sz 52.50.Dg 52.59.Bi |
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