光学元件表面疵病标准板系统设计

为解决大口径光学元件表面疵病检测设备的精确测量、校准和溯源问题。设计了用于标定表面疵病检测系统的标准板，通过电子束曝光将定标图案转移至掩模板，再采用反应离子束刻蚀的方法制作标准板。通过扫描电镜测量标准板上各标准线的真实线宽尺寸，并以扫描电镜测量结果为参考值标定大口径表面疵病检测系统。利用所设计的标准板标定基于散射成像法的大口径表面疵病检测系统。结果表明，当疵病线宽尺寸大于45 μm时，疵病的散射像满足几何成像原理，当疵病宽度尺寸小于45 μm时，需按标定结果进行计算。

Calibration Plate Design for Surface Defect Inspecting System

A reference plate is designed to calibrate surface defects inspecting system. By using it, the defects inspecting system can detect surface defects accurately. The main uncertainty which would affect the system′s measuring accuracy is analyzed to find out the way of reducing it. Electron beam is used to transfer all the design chart to mask plate, and the calibrate plate is produced by using the reactive ion beam etching. Every standard scratch′s actual dimension is measured by scanning electron microscope, and the measured dimension is used to calibrate the surface defects inspecting system. Experiments are performed to calibrate the surface defect inspecting system for large aperture optical components. The result shows that the scattering image is meet to geometrical image result when the dimension of scratch is greater than 45 μm, while it should be computed by calibrated results as the dimension of scratch is less than 45 μm.