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A breakthrough to the plasma deposited dry-developable e-beam resist |
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| Authors: | Shuzo Hattori Shinzo Morita Masao Yamada Junji Tamano Masayuki Ieda |
| Abstract: | This paper presents the preliminary results of efforts to improve dry processed electron beam resist materials using plasma polymerization coating technology. Three approaches investigated were chemical susceptibility modification, the use of multilayer resist structures, and the effect of grafting reactions. |
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