Internal oxidation of ternary alloys. Part II: Kinetics in the presence of an external scale |
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| Authors: | S W Guan H C Yi W W Smeltzer |
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| Affiliation: | (1) Institute for Materials Research and Department of materials Science and Engineering, McMaster University, L8S 4M1 Hamilton, Ontario, Canada;(2) Present address: Madison Chemical Industries Inc., 490 McGeachie Drive, L9T 3Y5 Milton, Ontario, Canada |
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| Abstract: | Classic kinetics equations of internal oxidation of binary alloys associated with the formation of an external oxide scale of the base metal have been simplified by applying mathematical asymptotical analysis. An analysis for the case of ternary alloys is also presented. The analysis involves simultaneous internal oxidation of the two solutes in the ternary alloys below the external oxide scale of the base metal. The kinetics equations derived are applied to calculate depths of internal oxidation zones of Ni-4 at.% Al-1 at.% Si alloys oxidized in 760 torr of oxygen at 800°C. |
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| Keywords: | internal oxidation external oxidation dilute ternary alloys Ni– Al– Si |
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