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Characteristics of TiVCrAlZr multi-element nitride films prepared by reactive sputtering |
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| Authors: | Zue-Chin Chang Sheng Han Yi-Kun Chen |
| Affiliation: | a Department of Mechanical Engineering, National Chin-Yi University of Technology, 35, Lane 215, Section 1, Chung-Shan Road, Taiping City, Taichung County 41101, Taiwan, ROC b Department of Materials Science and Engineering, National Chung Hsing University, 250 Kuo Kuang Road, Taichung 40227, Taiwan, ROC c Department of Leisure and Recreation Management, National Taichung Institute of Technology, 129 San-Min Road, Section 3, Taichung 40401, Taiwan, ROC d Missile & Rocket Systems Research Division, Chung-Shan Institute of Science & Technology, Box 90008-8 Lung-Tan, Tao-Yuan 32599, Taiwan, ROC |
| Abstract: | Nitride films of multi-element TiVCrAlZr alloy were prepared on silicon substrates by reactive radio-frequency magnetron sputtering under different nitrogen/argon flow ratios ranging from 0% to 66.7%. The alloy film deposited in pure argon exhibited an amorphous structure and a very smooth surface, while a face-center-cubic solid-solution structure with strong (2 2 0), (1 1 1) to (2 0 0) orientation and different fracture feature and surface morphologies was observed in those films which were prepared under various nitrogen flow ratios. With increasing nitrogen flow ratio, the hardness and elastic modulus of the films increased and reached maximum values of 11 and 151 GPa at 50%. |
| Keywords: | Multi-element alloy Radio-frequency magnetron sputtering Face-center-cubic solid-solution |
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