A model of fine particles deposition on smooth surfaces: II—Comparison with experimental data and simplified models |
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Authors: | R. Maniero |
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Affiliation: | Dipartimento di Principi e Impianti di Ingegneria Chimica, Università di Padova,Via Marzolo 9, 35131 Padova, Italy |
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Abstract: | The application of a model of fine particles initial deposition from a flowing suspension on smooth surfaces is discussed by comparison with literature experimental data and simplified models (Leveque equation). The model and its original features, including an accurate account of particle-surface interactions and ad hoc solution techniques, with special emphasis on the treatment of boundaries, have been thoroughly presented in Part I. The model demonstrates that in many circumstances diffusion is the limiting mechanism so that simple models based on a continuous approach (through particles concentration) together with perfect sink assumption are accurate enough. Departures from such circumstances are identified by means of a parametric study based on our model. The comparison with the experimental data also suggests additional characterizations needed for future experimental investigations. |
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Keywords: | Colloidal phenomena Diffusion Interface Laminar flow Stochastic processes Brownian dynamics Colloids Van der Waals Stochastic models Deposition Adhesion |
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