Submicron resolution deep UV photolithography |
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Authors: | Voshchenkov AM Herrmann H |
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Affiliation: | Bell Telephone Laboratories, Holmdel, USA; |
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Abstract: | A vacuum contact printing technique was used to evaluate the resolution limits of deep UV photolithography with a 300±30 nm exposure band. For the first time, an array of 200 chip sites containing 0.5 ?m meander patterns 3 cm long was clearly resolved in AZ 2415 positive resist across 2 in diameter silicon wafers. |
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