电沉积(Ni-W-P)-Si3N4复合镀层及性能研究

采用电沉积方法,在Ni-W-P合金中复合S i3N4微粒,获得(Ni-W-P)-S i3N4复合镀层。研究了镀液中Si3N4质量浓度、电流密度以及搅拌速度等工艺条件对复合镀层中Si3N4质量分数的影响。X-射线衍射、扫描电子显微镜测试结果表明:Si3N4微粒在镀层中均匀分布,与Ni-W-P合金各自在特定的角度出现衍射特征峰,彼此之间互不干扰。随着镀层中Si3N4质量分数的增加,镀层的性能均按照一定的规律发生变化。当Si3N4的质量分数为最大值10.3%时,镀层性能在各组实验比较中均最优,耐磨性能最好。

Study on Electrodeposition and Performances of (Ni-W-P)-Si3N4 Composite Coating

Using method of adding Si3N4 particles and controlling the deposition conditions,(Ni-W-P)-Si3N4 composite coating was obtained.Effects of deposition conditions on the Si3N4 content in the composites were studied.SEM tests indicate that the distribution of Si3N4 particles in the composite coating is even,which will have a considerable effect on the hardness and wear resistance of the deposit.XRD patterns of the deposit show that the Ni and Si3N4 particle diffraction peaks appear at their own given angle respectively,independent of each other.The performances of the composite coating increase with the increase in the Si3N4 content in the deposit,and wear resistance of the deposit is the best when the content of Si3N4 particles in the deposit is 10.3%.