Investigation on mechanism of polymer filling in high-aspect-ratio trenches for through-silicon-via (TSV) application |
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Authors: | YingTao Ding YangYang Yan QianWen Chen ShiWei Wang Xiu Chen YueYang Chen |
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Affiliation: | 1. School of Information and Electronics, Beijing Institute of Technology, Beijing, 100081, China
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Abstract: | Vacuum-assisted spin-coating is an effective polymer filling technology for sidewall insulating of through-silicon-via (TSV). This paper investigated the flow mechanism of the vacuum-assisted polymer filling process based on experiments and numerical simulation, and studied the effect of vacuum pressure, viscosity of polymer and aspect-ratio of trench on the filling performance. A 2D axisymmetric model, consisting of polymer partially filled into the trench and void at the bottom of trench, was developed for the computational fluid dynamics (CFD) simulation. The simulation results indicate that the vacuum-assisted polymer filling process goes through four stages, including bubble formation, bubble burst, air elimination and polymer re-filling. Moreover, the simulation results suggest that the pressure significantly affects the bubble formation and the polymer re-filling procedure, and the polymer viscosity and the trench aspect-ratio influence the duration of air elimination. |
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Keywords: | through-silicon-via(TSV) vacuum process polymer filling computational fluid dynamics(CFD) |
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