氮氧化硅薄膜红外吸收特性的研究

利用等离子体增强化学气相沉积法沉积氮氧化硅(SiOxNy)薄膜,通过X射线光电子能谱仪、傅里叶变换红外光谱仪、椭偏仪等表征技术,研究不同N2O与NH3流量比R条件下薄膜的组分、光学常数及红外吸收特性.研究结果表明:随着流量比R的增加,SiOxNy薄膜中O的相对百分含量提高,N含量降低,而Si含量基本不变；薄膜由于Si-...

Infrared Absorption Properties of Silicon Oxynitride Films

Silicon oxynitride films were deposited in a PECVD reactor.The N2O/NH3 flow ratio was varied in order to obtain different oxynitride compositions.The films were characterized by X-ray photoelectron spectroscopy,spectroscopic ellipsometry and Fourier transform infrared absorption spectroscopy.The compositions,optical constants and infrared optical absorption properties of silicon oxynitride films were investigated.The results show that the O atomic content increases,the N atomic content decreases,and the Si atomic content keeps nearly unchanged as the N2O/NH3 flow ratio increases.The silicon oxynitride films show a dominant infrared absorption peak due to the Si—O/Si—N bond,with the infrared absorption peak located between 11.6 μm(860 cm-1) and 9.4 μm(1 063 cm-1).The position of absorption peak also shifts to a shorter wavelength when the N2O/NH3 flow ratio increases.Meanwhile,the width of absorption peak increases firstly and then decreases with the increase in N2O/NH3 flow ratio.Moreover,the H content and the refractive index decrease with the increase in flow ratio.Compared with silicon oxide and silicon nitride films,the silicon oxynitride films with a specific composition have the largest width of absorption peak and the strongest intensity between 8 μm and 12 μm,which make them be well suited for the absorber of thermal detectors.