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Mg:Ce:Fe:LN晶体的生长及位相共轭分析
引用本文:王义杰,代丽,徐玉恒. Mg:Ce:Fe:LN晶体的生长及位相共轭分析[J]. 压电与声光, 2007, 29(4): 451-454
作者姓名:王义杰  代丽  徐玉恒
作者单位:1. 哈尔滨理工大学,应用科学学院,黑龙江,哈尔滨,150080
2. 哈尔滨工业大学,应用化学系,黑龙江,哈尔滨,150001
摘    要:在Ce:Fe:LN中掺进不同摩尔分数(0,2%,4%,6%)的MgO首次以提拉法生长Mg:Ce:Fe:LN晶体,并对晶体进行极化、氧化和还原处理。测试晶体的吸收光谱和光损伤阈值。Mg:Ce:Fe:LN晶体吸收光谱吸收边相对Ce:Fe:LN晶体发生紫移。Mg:Ce:Fe:LN晶体光损伤阈值比Ce:Fe:LN晶体增大,研究了Mg:Ce:Fe:LN晶体吸收边移动机理和光损伤阈值增加机理。采用4波混频光路测试Mg:Ce:Fe:LN晶体位相共轭反射率和响应时间,Mg:Ce:Fe:LN晶体位相共轭反射率相对Ce:Fe:LN晶体降低,但响应速度增加。以x(Mg)2%(摩尔分数):Ce:Fe:LN晶体位相共轭镜消除信号光波的位相畸变。

关 键 词:Mg:Ce:Fe:LN晶体  吸收光谱  光损伤阈值
文章编号:1004-2474(2007)04-0451-04
修稿时间:2006-09-25

Growth of Mg:Ce:Fe:LN Crystals and Analysis of the Phase Conjugate
WANG Yi-jie,DAI Li,XU Yu-heng. Growth of Mg:Ce:Fe:LN Crystals and Analysis of the Phase Conjugate[J]. Piezoelectrics & Acoustooptics, 2007, 29(4): 451-454
Authors:WANG Yi-jie  DAI Li  XU Yu-heng
Affiliation:1. Applied Science College, Harbin University of Science and Technology, Harbin 150080, China; 2. Dept. of Applied Chemistry, Harbin Institute of Technology, Harbin 150001, China
Abstract:Doped with different concentrations(0,2%,4%,6% mol) of MgO in Ce:Fe:LN crystals,Mg:Ce:Fe:LN crystals were grown by Czochralski method for the first time.The crystals were going on poling oxidation and reduction treatment.The absorption spectra and photo damage thresholds of crystals were measured.The absorption edge of Mg:Ce:Fe:LN crystals shifts towards violet band compared with Ce:Fe:LN crystals.The photo damage thresholds of Mg:Ce:Fe:LN crystals are increased relative to Ce:Fe:LN.The moving mechanism of absorption edge of Mg:Ce:Fe:LN crystals and photo damage thresholds increasing mechanism were studied The phase conjugate reflectivity and response time were measured by four-wave mixing light path.The phase conjugate reflectivity of Mg:Ce:Fe:LN crystals compared with Ce:Fe:LN crystals had decreased but response speed had increased.The phase distortion of signal light wave is corrected by Mg(2%):Ce:Fe:LN phase conjugate mirror crystal.
Keywords:Mg:Ce:Fe:LN crystal  absorption spectra  photo damage thresholds
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