六方氮化硼在二维晶体微电子器件中的应用与进展

六方氮化硼(h-BN)因其优异的性能和潜在的应用前景而受到广泛关注.着眼于h-BN在微电子器件领域中的发展与应用,总结了近年来国内外通过化学气相沉积(CVD)方法实现h-BN的高质量、大规模可控制备及图形化的代表性工作.围绕h-BN的高介电常数、原子级平滑表面、高导热性和高稳定性,重点介绍了h-BN在二维晶体介电衬底、...

Application and Progress of Hexagonal Boron Nitride in Two-Dimensional Crystal Microelectronic Devices

Due to excellent properties and potential application prospects,Hexagonal boron nitride(h-BN)has received extensive attention.Based on the development and application of h-BN in microelectronic devices,the recent representative studies of high-quality,large-scale controllable preparation and patterning of h-BN achieved by chemical vapor deposition(CVD)method at home and abroad are summarized.The research progresses of h-BN for two-dimensional crystal dielectric substrates,the thermal management platform of semiconductor devices and integrated circuit packaging materials are reviewed emphatically from the aspects of the high dielectric constant,atomic level smooth surface,high thermal conductivity and high stability of h-BN.The research results of the application of h-BN in tunneling devices and memory arrays are briefly presented.Finally,the obtained achievements of large-scale applications of h-BN in new microelectronic devices are summarized,and the future research and trends of the field are prospected.