Highly reliable a‐IGZO TFTs on a plastic substrate for flexible AMOLED displays |
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Authors: | Shintaro Nakano Nobuyoshi Saito Kentaro Miura Tatsunori Sakano Tomomasa Ueda Keiji Sugi Hajime Yamaguchi Isao Amemiya Masato Hiramatsu Arichika Ishida |
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Affiliation: | 1. Toshiba Corp., Corporate Research & Development Center, , Kawasaki, Japan;2. Toshiba Mobile Display Co., Ltd, , Saitama, Japan |
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Abstract: | We have successfully reduced threshold voltage shifts of amorphous In–Ga–Zn–O thin‐film transistors (a‐IGZO TFTs) on transparent polyimide films against bias‐temperature stress below 100 mV, which is equivalent to those on glass substrates. This high reliability was achieved by dense IGZO thin films and annealing temperature below 300 °C. We have reduced bulk defects of IGZO thin films and interface defects between gate insulator and IGZO thin film by optimizing deposition conditions of IGZO thin films and annealing conditions. Furthermore, a 3.0‐in. flexible active‐matrix organic light‐emitting diode was demonstrated with the highly reliable a‐IGZO TFT backplane on polyimide film. The polyimide film coating process is compatible with mass‐production lines. We believe that flexible organic light‐emitting diode displays can be mass produced using a‐IGZO TFT backplane on polyimide films. |
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Keywords: | a‐IGZO flexible AMOLED reliability |
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