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Effects of growth interruption on the properties of InGaN/GaN MQWs grown by MOCVD
Authors:Nan-hui Niu  Huai-bing Wang  Jian-ping Liu  Nai-xin Liu  Yan-hui Xing  Jun Han  Jun Deng  Guang-di Shen
Affiliation:(1) Institute of Information, Beijing Optoelectronic Technology Laboratory, Beijing University of Technology Beijing, 100022, China
Abstract:InGaN/GaN MQWs structures were grown by MOCVD. The effects of the growth interruption time on the optical and structural properties of InGaN/GaN MQWs were investigated. The experimental results show that the growth interruption can improve the interface quality,increase the intensity of photoluminescence (PL) and electroluminescence (EL); but if the interruption time was too long,the well thickness and the average In composition of MQWs decreased,and the EL intensity also decreased due to poor interface quality and impurities derived from growth interruption.
Keywords:TN305
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