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Initial stages of growth of GaN over (0001) Al2O3 substrate using MBE: a crystallographic analysis of the defects
Authors:V Potin  P Ruterana and G Nouet
Affiliation:

Laboratoire d'Etudes et de Recherche sur les Matériaux, UPRESA CNRS 6004, Institut des Sciences de la Matière et du Rayonnement, 6 Bd du Maréchal Juin, 14050 Caen Cedex, France

Abstract:An AlN buffer layer grown on (0001) sapphire substrate by molecular beam epitaxy has been studied. It is found to be made of small grains having a common 0001] axis parallel to that of the substrate. Some grains are rotated around this axis and the angle rotation can reach 20° leading to a new epitaxial relationship (0001)sap//(0001)AlN and 110]sap//210]AlN. A model for the atomic structure of one of these grain boundaries is proposed using high resolution electron microscopy and extensive image simulation.
Keywords:AlN  Sapphire  Grain boundary  High resolution electron microscopy  Molecular beam epitaxy
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