| 纳米级精度的线宽测量仪 |
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| 引用本文： | 王云庆,李庆祥.纳米级精度的线宽测量仪[J].光学精密工程,1994,2(1):83-88. |
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| 作者姓名： | 王云庆 李庆祥 |
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| 作者单位： | 清华大学精密仪器系 |
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| 摘 要： | 在大规模集成电路生产中,对掩膜版与硅片刻线宽度的在线检测是保证质量的重要手段。本文介绍了一种高精度,自动化的线宽测量仪。阐述了其原理,构成及设计中有关问题。经实验表明:该仪器的重复测量精度≤±0.005μm;测量精度为±0.02μm.
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| 关 键 词： | 线宽测量 显微镜 图像采集 微机处理 |
| 收稿时间： | 1993-12-01 |
A Linewidth Measuring Instrument with Nanometer Accuracy |
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| Wang Yunqing,Li Qingxiang,Xue Shifu and Zhou Zhaoying.A Linewidth Measuring Instrument with Nanometer Accuracy[J].Optics and Precision Engineering,1994,2(1):83-88. |
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| Authors: | Wang Yunqing Li Qingxiang Xue Shifu and Zhou Zhaoying |
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| Affiliation: | Dept.of Precision Instruments, Tsinghua Uniuersity, Beijing 100084 |
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| Abstract: | In LSI production,an important means of guaranteeing quality is to test the linewidthof photomasks and wafers on line,This paper introduces an automatic linewidth measuring instrument with high accuracy,elaborates its principle,constitution and some problems in design. The tests show:its repeatabiiity is up to±0.005μm,accuracy is ±0.02μm. |
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| Keywords: | Linewidth measurement Microscope Image collection Microcomputer processing |
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