UV–Ozone Interfacial Modification in Organic Transistors for High‐Sensitivity NO2 Detection |
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| Authors: | Wei Huang Xinming Zhuang Ferdinand S Melkonyan Binghao Wang Li Zeng Gang Wang Shijiao Han Michael J Bedzyk Junsheng Yu Tobin J Marks Antonio Facchetti |
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| Affiliation: | 1. State Key Laboratory of Electronic Thin Films and Integrated Devices, School of Optoelectronic Information, University of Electronic Science and Technology of China (UESTC), Chengdu, China;2. Department of Chemistry, Northwestern University, Evanston, IL, USA;3. Department of Materials Science and Engineering and Applied Physics Program, Northwestern University, Evanston, IL, USA;4. Flexterra Inc., Skokie, IL, USA |
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| Abstract: | A new type of nitrogen dioxide (NO2) gas sensor based on copper phthalocyanine (CuPc) thin film transistors (TFTs) with a simple, low‐cost UV–ozone (UVO)‐treated polymeric gate dielectric is reported here. The NO2 sensitivity of these TFTs with the dielectric surface UVO treatment is ≈400× greater for NO2] = 30 ppm than for those without UVO treatment. Importantly, the sensitivity is ≈50× greater for NO2] = 1 ppm with the UVO‐treated TFTs, and a limit of detection of ≈400 ppb is achieved with this sensing platform. The morphology, microstructure, and chemical composition of the gate dielectric and CuPc films are analyzed by atomic force microscopy, grazing incident X‐ray diffraction, X‐ray photoelectron spectroscopy, and Fourier transform infrared spectroscopy, revealing that the enhanced sensing performance originates from UVO‐derived hydroxylated species on the dielectric surface and not from chemical reactions between NO2 and the dielectric/semiconductor components. This work demonstrates that dielectric/semiconductor interface engineering is essential for readily manufacturable high‐performance TFT‐based gas sensors. |
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| Keywords: | interface trap nitrogen dioxide sensors organic thin‐film transistors UV– ozone |
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