TiSiN-Ag磁控溅射薄膜的微结构和性能

为了研究Ag元素对Ti Si N薄膜结构及性能的影响,通过磁控溅射法制备了不同Ag含量的Ti Si N-Ag薄膜,采用EDS,XRD,XPS,TEM,CSM纳米压痕仪,UMT-2摩擦磨损仪和BRUKER三维形貌仪对薄膜的成分、微结构、力学性能和摩擦磨损性能进行了研究。结果表明:Ti Si N-Ag薄膜是由面心立方Ti N相、非晶Si3N4相和面心立方单质Ag相组成,单质Ag相的存在阻碍Ti N晶粒的生长;随Ag原子分数的增加,单质Ag相增加,导致Ti Si NAg薄膜的硬度和弹性模量逐渐下降;单质Ag相具有润滑作用,使薄膜硬度降低,磨痕中的硬质颗粒减少,摩擦系数从0.70降至0.39,磨损率也逐渐降低。

Microstructure and Properties of TiSiN-Ag Films Deposited by Magnetron Sputtering

TiSiN-Ag films with different Ag conteuts were deposited by magnetron sputtering method,and EDS,XRD,TEM,CSM nano-indenter,UMT-2 wear tester and BRUKER 3D profilometer were used to research the composition,microstructue,mechanical property and tribological property of the films.Results showed that TiSiN-Ag films were composed of fcc TiN,amorphous Si3N4 and fcc Ag,and the existence of Ag phase hindered the growth of TiN crystal.With the increase of Ag content,soft Ag phase increased,leading to the decrease of hardness and elastic modulus of the films.Moreover,Ag phase as the lubrication phase could reduce the hardness of films and diminish the number of solid particles in wear scar.The friction coefficient of films decreased from 0.70 to 0.39 and wear rate decreased gradually.