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Thermal barrier coatings produced by chemical vapor deposition
Affiliation:1. Division of Cardiovascular Surgery, Severance Cardiovascular Hospital, Yonsei University College of Medicine, Yonsei University Health System, Seoul, Republic of Korea;2. Institute for Bio-Medical Convergence, College of Medicine, Catholic Kwandong University, Gangneung-si, Gangwon-do, 210-701, Republic of Korea;3. Department of Integrated Omics for Biomedical Sciences, Graduate School, Yonsei University, Seoul, 03722, Republic of Korea;4. Catholic Kwandong University, International St. Mary''s Hospital, Incheon Metropolitan City, 404-834, Republic of Korea;1. Department of Physics, University of Isfahan, 81746-73441, Isfahan, Iran;2. Department of Faculty Science, Shahid Bahonar Engineering College, Shiraz, Iran;1. SOKENDAI (The Graduate University for Advanced Studies), Toki, Japan;2. National Institute for Fusion Science, Toki, Japan;3. The Graduate School of System Informatics, Kobe University, Kobe, Japan;1. School of Optoelectronic Engineering, Nanjing University of Posts and Telecommunications, Nanjing, 210023, China;2. Department of Optical Science and Engineering, Fudan University, Shanghai, 200433, China;3. Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai, 200083, China;4. Department of Physics, Hanyang University, Seoul, 04763, South Korea
Abstract:Yttria stabilized zirconia (YSZ) can be employed as thermal barrier coatings (TBCs) on Ni-based super alloys in gas turbines and aircraft engines. The YSZ coatings have been fabricated by atmospheric plasma spraying or electron-beam physical vapor deposition. The increase in operation temperature of gas turbines demands another fabrication process to obtain high quality TBCs. Chemical vapor deposition (CVD) can be an alternative route to prepare TBCs due to excellent conformal coverage and columnar microstructure. This paper reviews the fabrication of YSZ films by conventional thermal CVD and plasma CVD intended for TBCs. A new laser CVD developed by our group with a high deposition rate of 660 μm h−1 was also briefly introduced.
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