Theoretical study of the SiO2/Si interface and its effect on energy band profile and MOSFET gate tunneling current |
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Authors: | Zhu Huiwen Liu Yongsong Mao Lingfeng Shen Jingqin Zhu Zhiyan Tang Weihua |
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Affiliation: | 1. Department of Physics, Center for Optoelectronics Materials and Devices, Zhejiang Sci-Tech University,Hangzhou 310018, China 2. School of Electronics & Information Engineering, Soochow University, Suzhou 215021, China |
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Abstract: | Two SiO2/Si interface structures, which are described by the double bonded model (DBM) and the bridge oxygen model (BOM), have been theoretically studied via first-principle calculations. First-principle simula-tions demonstrate that the width of the transition region for the interface structure described by DBM is larger than that for the interface structure described by BOM. Such a difference will result in a difference in the gate leakage current. Tunneling current calculation demonstrates that the SiO2/Si interface structure described by DBM leads to a larger gate leakage current. |
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Keywords: | interface MOSFETs gate tunneling current |
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