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Diagram representations of charge pumping processes in CMOS transistors
Authors:Huang Xinyun  Jiao Guangfan  Shen Chen  Cao Wei  Huang Daming  Li Mingfu
Affiliation:1. State Key Laboratory of ASIC & System,Department of Microelectronics,Fudan University,Shanghai 201203,China
2. SNDL,ECE Department,National University of Singapore,Singapore 117576,Singapore
3. State Key Laboratory of ASIC & System,Department of Microelectronics,Fudan University,Shanghai 201203,China;SNDL,ECE Department,National University of Singapore,Singapore 117576,Singapore
Abstract:A diagram representation method is proposed to interpret the complicated charge pumping (CP) processes.The fast and slow traps in CP measurement are defined.Some phenomena such as CP pulse rise/fall time dependence,frequency dependence,the voltage dependence for the fast and slow traps,and the geometric CP component are clearly illustrated at a glance by the diagram representation.For the slow trap CP measurement,there is a transition stage and a steady stage due to the asymmetry of the electron and hole capture,and the CP current is determined by the lower capturing electron or hole component.The method is used to discuss the legitimacy of the newly developed modified charge pumping method.
Keywords:charge pumping  interface-trap generation  bias temperature instability  modified CP  oxide charge
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