沉淀-超声法制备纳米二氧化硅

在化学沉淀超声分散条件下,研究了体系pH值、表面活性剂种类、分散剂用量、干燥方式、超声分散等因素对产物纳米二氧化硅粒径的影响。通过实验确定了沉淀-超声法制备纳米二氧化硅的最佳工艺条件。采用XRD、TG-DTA及激光粒度仪等测试手段对产物进行了表征。结果表明:在最佳工艺条件下制得了粒径为40 nm的二氧化硅粉体。研究表明,沉淀-超声法是一种制备纳米二氧化硅的简单的新方法,所得粉体粒径小,粒径分布窄,实验条件要求低,操作简便、易行,便于工业化生产。

Sedimentation-Ultrasonic Method for Preparation of Nanometer Silicon Dioxide

Ultrasonic dispersion method was applied to chemical precipitation process.The effects of pH value,types of surfactant,dispersing agent dosage,drying mode and ultrasonic dispersion on particle size were studied.The optimal technolgical conditions were obtained.The partied size and crystal type of the products were characterized by XRD,TG-DTA and a laser particle analysis device.The results showed that nano-SiO_2 with a diameter of 40 nm was prepared under the optimal conditions.We found that precipitation-ultrasonic method is a simple and new method to prepare nanometer SiO_2.The products have smaller perticle size and narrower particle distribution.The method is simple,convenient and easy to be industrialized.