Si/Si1-xGex heterojunction bipolartransistors with high breakdown voltage

Heterojunction bipolar transistors are desirable for microwave applications because a low base resistance can be achieved yielding high maximum frequency of oscillation. Here we report Si/Si_1-xGe _x heterojunction bipolar transistors with high breakdown voltages and excellent small-signal microwave characteristics. The transistors structures were grown by molecular beam epitaxy and fabricated by a double-mesa process. Measured f_T and f_max were 10 and 22 GHz, respectively, for transistors with BV_CBO of 40 V