| 甲烷浓度对金刚石薄膜(100)织构生长的影响 |
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| 引用本文： | 曹菊琴,汪建华,满卫东,熊礼威. 甲烷浓度对金刚石薄膜(100)织构生长的影响[J]. 应用化工, 2006, 35(10): 745-746,751 |
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| 作者姓名： | 曹菊琴 汪建华 满卫东 熊礼威 |
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| 作者单位： | 湖北省等离子体化学与新材料重点实验室,湖北,武汉,430073 |
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| 基金项目： | 湖北省科技攻关项目;湖北省高等学校优秀中青年科技创新团队资助计划项目 |
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| 摘 要： | 以H2和CH4的混合气体为气源,用微波等离子体辅助化学气相沉积法(MPECVD)在1 cm×1 cm S i(100)基体上沉积了金刚石薄膜。研究了不同的甲烷浓度对金刚石薄膜(100)织构生长趋势的影响。分别采用扫描电子显微镜(SEM),Ram an光谱对金刚石膜的表面形貌、质量进行了分析。结果表明,当基体温度为750℃,气压为4.8×103Pa,甲烷浓度为1.4%时,薄膜表面为(100)织构。
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| 关 键 词： | 微波等离子体辅助化学气相沉积 金刚石薄膜 (100)织构 |
| 文章编号： | 1671-3206（2006）10-0745-02 |
| 收稿时间： | 2006-09-03 |
| 修稿时间： | 2006-09-03 |
Effect of methane concentration on the growth of (100) texture diamond thin films |
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| CAO Ju-qin,WANG Jian-hua,MAN Wei-dong,XIONG Li-wei. Effect of methane concentration on the growth of (100) texture diamond thin films[J]. Applied chemical industry, 2006, 35(10): 745-746,751 |
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| Authors: | CAO Ju-qin WANG Jian-hua MAN Wei-dong XIONG Li-wei |
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| Abstract: | Diamond thin film have been deposited onto 1×1 cm ~2 silicon(100) substrates using microwave plasma enhanced chemical vapor depositi on(MPECVD) from a gas mixture of methane and hydrogen.The effects of methane con centration on the growth of(100) texture diamond film have been investigated.Th e surface morphologies and quality of samples are observed with scanning electro n microscopy(SEM) and Raman spectrum respectively.The experimental results show that when the substrate temperature is 750℃,deposition pressure is 4.8×10~3 Pa and the methane concentration is 1.4%,(100) texture diamond film is deposited. |
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| Keywords: | microwave plasma enhanced chemical vapor deposition diamond thin films (100)texture |
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