Studies on the oxidation behavior of Inconel 625 between 873 and 1523 K |
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Authors: | Lalit Kumar R. Venkataramani M. Sundararaman P. Mukhopadhyay S. P. Garg |
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Affiliation: | (1) Metallurgy Division, Bhabha Atomic Research Centre, 400 085 Bombay, India |
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Abstract: | The oxidation behavior of Inconel 625 during the early stages (<150 min) has been studied at oxygen pressures (PO2) of 0.12 kPa (0.9 torr) and 101.3 kPa (760 torr) in the temperature range of 1323 K to 1523 K by using TGA and between 873 and 1523 K by using XPS, AES, and EDS. The TGA results correlated well with those obtained by surface analysis of the oxide films. The results of XPS and AES analysis suggested that two distinctly different oxidation mechanisms operate, depending on the temperature of oxidation. Enrichment of the oxide films with respect to Cr2O3 occurs above 873 K, the degree of enrichment peaking at about 1200 K such that the oxide films formed at temperatures close to this consist almost exclusively of Cr2O3. At temperatures above 1300 K, the oxides of two minor alloying components, Nb and Ti, have been found to be present in the oxide films in significant proportions. The results have been discussed on the basis of the relative thermodynamic stabilities of the competing oxide phases and the diffusivities of the alloying elements in Inconel 625. |
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Keywords: | high-temperature oxidation kinetics of Inconel 625 TGA XPS AES EDS |
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