Electrodeposition and characterization of Fe80Ga20 alloy films

Due to its high magnetostriction and good mechanical properties Fe₈₀Ga₂₀ is interesting for magnetostrictive microactuators and sensors. Here we use electrodeposition to grow Fe–Ga films onto Au and Pt coated Si substrates by potentiostatic and pulse potential deposition. Composition, microstructure and structure are analysed. The desired composition of Fe₈₀Ga₂₀ was obtained at −1.4 V_SCE and −1.5 V_SCE, respectively. The origin of low reproducibility and high oxygen content up to 50 at.% is investigated. Optimum deposition conditions to achieve dense, homogeneous films with low oxygen content are identified. In these films the saturation magnetization reaches a maximum value of 1.7 T confirming the high quality of electrodeposited films.