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Rectangular Symmetry Morphologies in a Topographically Templated Block Copolymer |
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| Authors: | Amir Tavakkoli K. G. Adam F. Hannon Kevin W. Gotrik Alfredo Alexander‐Katz Caroline A. Ross Karl K. Berggren |
| Affiliation: | 1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA 02139, USA;2. NUS Graduate School for Integrative Sciences & Engineering (NGS), Singapore 117456;3. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA;4. Kavli Institute of Nanoscience, Technical University of Delft, Delft, The Netherlands |
| Abstract: | |
| Keywords: | block copolymers hybrid patterns templated self‐assembly graphoepitaxy square patterns |