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Nanotransfer Printing with sub‐10 nm Resolution Realized using Directed Self‐Assembly
Authors:Jae Won Jeong  Woon Ik Park  Lee‐Mi Do  Jong‐Hyun Park  Tae‐Heon Kim  Geesung Chae  Yeon Sik Jung
Affiliation:1. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak‐ro, Yuseong‐gu, Daejeon 305‐701, Republic of Korea;2. RFID/USN Research Department, Electronics and Telecommunications Research Institute (ETRI), 218 Gajeong‐dong Yuseong‐gu, Daejeon 305‐700, Republic of Korea;3. Material R&D Department, LG Display Co., Ltd., 1007, Deogeon‐ri,Wollong‐myeon, Paju‐si, Gyeonggi‐do, 413‐811, Republic of Korea
Abstract:
Keywords:nanotransfer printing  soft lithography  block copolymers  self‐assembly  polydimethylsiloxane
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