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任意层互连技术应用研究
引用本文:黄勇,吴会兰,朱兴华,陈正清.任意层互连技术应用研究[J].印制电路信息,2012(10):52-55.
作者姓名:黄勇  吴会兰  朱兴华  陈正清
作者单位:珠海方正印刷电路板发展有限公司
摘    要:任意层互连技术是目前高密度互连印制电路板领域新的工艺技术,通过微孔来实任意层与层之间的连接。本文主要介绍了任意层互连技术的应用进展,分析了电镀、导电膏及铜凸块三种微孔互连技术,同时,描述了各任意层互连方法的工艺技术流程,并对其进行了对比分析。

关 键 词:任意层互连  电镀填孔  导电膏  铜凸块

Application research of any layer interconnect technology
HUANG Yong,WU Hui-lan,ZHU Xing-hua,CHEN Zheng-qing.Application research of any layer interconnect technology[J].Printed Circuit Information,2012(10):52-55.
Authors:HUANG Yong  WU Hui-lan  ZHU Xing-hua  CHEN Zheng-qing
Affiliation:HUANG Yong WU Hui-lan ZHU Xing-hua CHEN Zheng-qing
Abstract:Any layer interconnect technology is the latest technology in the field of high density interconnect printed circuit board,which achieves the connection between any layers by microvia.In this paper,the application progress of any layer interconnect technology was introduced,three methods making microvia: plating,conductive paste,and copper bumps were told,as well as methods to achieve any layer interconnect process,and the analysis between them.
Keywords:Any layer interconnect  Via filling plating  Conductive paste  Copper bump
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