| 氦注入铝的热解吸谱 |
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| 引用本文： | 向鑫,陈长安,刘柯钊,饶咏初,彭丽霞. 氦注入铝的热解吸谱[J]. 真空科学与技术学报, 2010, 30(2). DOI: 10.3969/j.issn.1672-7126.2010.02.17 |
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| 作者姓名： | 向鑫 陈长安 刘柯钊 饶咏初 彭丽霞 |
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| 作者单位： | 表面物理与化学国家重点实验室,绵阳,621907 |
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| 基金项目： | 国家自然科学基金资助项目 |
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| 摘 要： | 用氦热解吸谱(THDS)研究了10keV,4.0×1017cm-2剂量He+辐照(200)择优取向Al的氦热解吸行为及其与升温速率的关系。结果显示,He解吸开始于270℃附近,THDS中无干扰峰存在。He解吸行为与升温速率密切相关,其解吸峰个数及峰位随升温速率的变化而改变,且不遵循通常的一级化学反应模型,而可能是多级或一级与多级化学反应的混合模型。
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| 关 键 词： | 氦热解吸谱 干扰峰 升温速率 解吸模型 |
Thermal Desorption Spectroscopy Study of Helium-Implanted Aluminum |
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| Xiang Xin,Chen Changan,Liu Kezhao,Rao Yongchu,Peng Lixia. Thermal Desorption Spectroscopy Study of Helium-Implanted Aluminum[J]. JOurnal of Vacuum Science and Technology, 2010, 30(2). DOI: 10.3969/j.issn.1672-7126.2010.02.17 |
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| Authors: | Xiang Xin Chen Changan Liu Kezhao Rao Yongchu Peng Lixia |
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| Affiliation: | Xiang Xin,Chen Chang'an,Liu Kezhao,Rao Yongchu,Peng Lixia(National Key Laboratory for Surface Physics , Chemistry,Mianyang 621907,China) |
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| Abstract: | Helium was implanted into the high purity aluminum samples with preferred orientation of (200),under the conditions of beam energy of 10keV and a helium dosage of 4.0×10(17) ions cm~(-2).The helium thermal desorption behavior of the He-implanted Al samples and its dependence on the heating rate were evaluated with thermal desorption spectroscopy (THDS).The results show that the on-set of He desorption is about 270℃,and no spurious peak can be observed in its THDS spectra.The heating rate significantly affects the number of THDS peaks, and the peak temperature positions,deviating from the widely accepted first-order chemical reaction model.Possible mechanisms were tentatively explained. |
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| Keywords: | Al Aluminum THDS Spurious peaks Heating rate Desorption model |
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