Sputtered p-Type Sb2Te3/(Bi,Sb)2Te3 Soft Superlattices Created by Nanoalloying

In this work, p-type nanoscale ??soft superlattices?? consisting of multilayer stacks of 25?nm Sb₂Te₃ on 25?nm (Bi_0.2Sb_0.8)₂Te₃ were fabricated by nanoalloying. With this technique, nanoscale layers of the elements Bi, Sb, and Te are deposited by sputtering onto a Si/SiO₂ substrate and subsequently annealed to induce interdiffusion and a solid-state reaction to form the final superlattices. Different combinations of annealing temperatures were used in the annealing process. The in-plane electronic properties (Seebeck coefficient, electrical conductivity, charge carrier concentration, and carrier mobility) of these soft superlattices were examined. The cross-plane thermal conductivity was determined using time-domain thermal reflectance (TDTR). Secondary-ion mass spectrometry (SIMS) depth profiles reveal that the nanostructured thin films exhibit high stability against thermal interdiffusion during the annealing process. X-ray patterns of the samples display very strong texture with preferred c-orientation of the crystallites after the heat treatment. Scanning electron microscopy (SEM) cross-section images of the films show distinctly polycrystalline structure with increasing grain size for higher annealing temperatures, as confirmed by x-ray diffraction (XRD) analysis. Very high power factors exceeding 40???W/cm?K², similar to values for bulk single crystals with comparable compositions, are observed for the soft superlattices. The nanostructure appears to be stable up to 300°C. For a sample annealed at 150°C, a thermal conductivity as low as 0.45?W/mK was determined. Based on different assumptions concerning the degree of anisotropy of the transport properties, a cross-plane figure of merit ZT of 0.6 to 1.9 can be estimated for the thin films annealed at 300°C.