基于ANSYS模拟的基体表面温度场对纳米金刚石膜沉积的影响

为得到高质量的纳米金刚石膜,采用ANSYS软件对基体表面的温度场进行仿真,分别模拟不同热丝数量、不同热丝间距以及不同热丝/基体间距对基体表面温度场的影响并通过试验进一步验证。结果表明:热丝数量与热丝间距对基体表面温度场影响不大,实际应用中取适当值即可。当热丝/基体间距低于5 mm时,基体表面的温度场不均匀、呈波状起伏;当热丝/基体间距大于5 mm时,基体表面的平均温度随热丝/基体间距增大而下降,基体表面的温度场波状起伏现象消失,温度场分布趋于均匀。当热丝/基体间距为7 mm时,基体表面的温度场最均匀,所沉积的纳米金刚石膜纯度最高、内应力最小、质量最优。

Effect of matrix surface temperature field on deposition of nano-diamond films based on ANSYS simulation

In order to obtain high-quality nano-diamond film, ANSYS software is used to simulate the temperature field on the matrix surface. The effects of hot wire number, hot wire distance and distance between the hot wire and the matrix on the temperature field of the matrix surface are simulated and further verified by experiments. The results show that the influences of the hot wire number and the hot wire distance on the temperature field of the matrix surface are not significant, so that just take the appropriate values in the practical application. When the distance between the hot wire and the matrix is less than 5 mm, the temperature field of the matrix surface is uneven and undulating. When the distance between the hot wire and the matrix is greater than 5 mm, the average temperature on the matrix surface decreases with the increase of the distance between the hot wire and the matrix, while the undulating temperature field on the matrix surface disappears and the distribution of the temperature field tends to be uniform. When the distance between the hot wire and the matrix is 7 mm, the temperature field on the matrix surface is the most uniform, and the deposited nano-diamond film has the highest purity, the lowest internal stress and the best quality.