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Characterization of activated reactive evaporated MoO3 thin films for gas sensor applications
Authors:O. M. Hussain  K. S. Rao
Affiliation:

Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati 517 502, India

Abstract:Thin films of molybdenum trioxide (MoO3) were prepared by activated reactive evaporation technique on Pyrex glass substrates. The influence of oxygen partial pressure, substrate temperature and glow power on the structure, surface morphology and optical properties of MoO3 thin films was studied. The MoO3 films deposited in an oxygen partial pressure of 1×10−3 Torr, glow power of 10 W and substrate temperature of 573 K exhibited predominantly a (0 k 0) orientation corresponding to the orthorhombic layered structure of -MoO3. The evaluated optical band gap was 3.24 eV. The sensing property of these MoO3 films for gases like NH3 and CO was also studied to see the applicability for environmental monitoring. We have observed that the MoO3 thin films of -phase are capable of detecting NH3 and CO gases at concentrations lower than 10 ppm in dry air.
Keywords:MoO3 thin films   Activated reactive evaporation   Structure   Optical properties   Gas sensor
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