氩气流量对四面体非晶碳膜结构和摩擦性能的影响

利用自主研制的45°单弯曲阴极电弧沉积系统,通过改变Ar流量(2,5以及10 ml/min),在p型(100)硅基底上制备了四面体非晶碳膜。借助表面轮廓仪测定薄膜厚度和粗糙度变化;采用X射线光电子谱获得薄膜微结构信息,利用残余应力仪和摩擦磨损试验机测定薄膜的内应力和摩擦学性能。实验结果表明:随Ar流量增加,薄膜的沉积速率降低,表面趋于光滑;薄膜中sp3含量由2 ml/min时的68%下降至10 ml/min时的55%;薄膜应力值随Ar流量的增大而减小,在10 ml/min处取得最小值;不同Ar流量条件下所制备薄膜的摩擦系数在0.024~0.045之间,且随Ar流量增加而增大。

Influence of Ar flow rate on Microstructures and Tribological Properties of Tetrahedral Amorphous Carbon Films

The tetrahedral amorphous carbon(ta-C) films were grown by vacuum filtered cathodic arc deposition on p-type Si(100) wafer substrate,with a lab built cathode.The impacts of the deposition conditions,such as the argon flow rate,pressure,and substrate temperature,on microstructures and tribological properties of the ta-C films were evaluated.The ta-C films were characterized with X-ray photoelectron spectroscopy and mechanical probes.The results show that the argon flow rate strongly affects the surface morphologies,deposition rate,and fraction of sp3.For example,as the Ar flow rate increased,the deposition rate and surface roughness decreased,accompanied with an increasing friction coefficient;the sp3 fraction decreased,from 68% at an argon flow rate of 2 ml/min to 56% at 10 ml/min;the compressive stress also decreased,minimized at 10 ml/min.The average friction coefficients of all the ta-C films were found to be in the range of 0.024 and 0.045.