首页 | 本学科首页   官方微博 | 高级检索  
     


Optimum parallel-face slanted surface-relief gratings
Authors:Maikisch Jonathan S  Gaylord Thomas K
Affiliation:School of Electrical and Computer Engineering and Microelectronics Research Center, Georgia Institute of Technology, Atlanta, Georgia 30332-0250, USA.
Abstract:Using a combination of rigorous coupled-wave analysis and simulated annealing, parallel-face slanted surface-relief gratings (PFSSRGs) are optimized. For substrate-mode optical interconnects, profiles are presented for both polymer and silicon PFSSRGs for both TE and TM polarizations at normal incidence with grating periods designed to give a 45 degrees output angle in the negative-first forward-diffracted order. The resulting diffraction efficiencies range from 70% to 99%, with a majority of the optimized profiles yielding over 90%. Optimized polymer profiles for TE and TM polarizations exhibit similar high diffraction efficiencies, but the TM profiles generally require greater groove depths. Silicon profiles optimized for TM polarization have greater diffraction efficiencies than those for TE polarization. Profiles that can feasibly be fabricated are identified, and sensitivities to groove depth, filling factor, slant angle, and incident angle are shown to be modest.
Keywords:
本文献已被 PubMed 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号