| Abstract: | The skin of springtails is well‐known for being able to repel water and organic liquids using their hexagonally arranged protrusions with reentrant structures. Here, a method to prepare 100 nm‐sized nanohoodoo arrays with quasi‐doubly reentrant structures over square centimeters through combining the nanosphere lithography and the template‐protected selective reactive ion etching technique is demonstrated. The top size of the nanohoodoos, the intra‐nanohoodoo distance, and the height of the nanohoodoos can be readily controlled by the plasma‐etching time of the polystyrene (PS) spheres, the size of the PS spheres used, and the reactive ion etching time of silicon. The strong structural control capability allows for the study of the relationship between the nanohoodoo structure and the wetting property. Superamphiphobic nanohoodoo arrays with outstanding water/organic liquid repellent properties are finally obtained. The superamphiphobic and liquid repellent properties endow the nanohoodoo arrays with remarkable self‐cleaning performance even using hot water droplets, anti‐fogging performance, and the surface‐enhanced Raman scattering sensitivity improvement by enriching the analyte molecules on the nanohoodoo arrays. Overall, the simple and massive production of the superamphiphobic nanohoodoo structures will push their practical application processes in diverse fields where wettability and liquid repellency need to be carefully engineered. |
