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改善GaAs MESFETs硫钝化稳定性研究的新探索
引用本文:李亚丽,杨瑞霞,杨克武. 改善GaAs MESFETs硫钝化稳定性研究的新探索[J]. 电子器件, 2005, 28(1): 135-137
作者姓名:李亚丽  杨瑞霞  杨克武
作者单位:河北工业大学信息工程学院,天津,300130;电子部第13研究所,石家庄,050051
基金项目:军事预研项目;河北省自然科学基金
摘    要:硫钝化可以明显改善GaAs金属半导体场效应晶体管(MESFETs)的击穿特性,但钝化效果不稳定。我们利用硫钝化和PECVDSiNr钝化相结合的方法,使钝化的稳定性得到了提高,但同时击穿电压会出现下降。击穿电压下降的主要原因是:As-S键很不稳定,在较高温度下分解,使GaAs表面负电荷密度减小,击穿电压下降。

关 键 词:硫钝化  GaAs MESFETs  稳定性  PECVD SiNx
文章编号:1005-9490(2005)01-0135-03

An New Research in Improving the Sulfur Passivation Stability of GaAs MESFETs
LI Ya-li,YANG Rui-xia,YANG Ke-wu. An New Research in Improving the Sulfur Passivation Stability of GaAs MESFETs[J]. Journal of Electron Devices, 2005, 28(1): 135-137
Authors:LI Ya-li  YANG Rui-xia  YANG Ke-wu
Abstract:The breakdown characteristic of GaAs metal-semiconductor field effect transistors (MESFETs) can be greatly improved by sulfur passivation technique. However, the passivation effect is unstable. A novel method combining sulfur passivation with PECVD SiN_x passivation is developed. The experiment results indicate that a stable passivation effect can be achieved by this passivation technique, but the breakdown voltage decreased simultaneously. Breaking down of As-S bond in high temperature reduced the density of negative charge, which is the main reason that the breakdown voltage decreased.
Keywords:GaAs MESFETs  PECVD SiNx
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