氮流量比对磁控溅射(CoCrFeNi)Nx高熵合金薄膜的组织和性能的影响

采用直流磁控溅射法制备(CoCrFeNi)N_x高熵薄膜，研究了氮流量比对薄膜的力学性能和电磁性能的影响。结果表明，在不同氮流量比条件下制备的(CoCrFeNi)N_x薄膜，都具有致密的组织、简单的FCC结构并呈现(200)择优取向。随着氮流量比从10%提高到30%，薄膜的硬度和弹性模量随之增大，其最大值达到14 GPa和212 GPa；电阻率基本上呈增大的趋势，最大值达到138 μΩ?cm；饱和磁化强度和磁导率随之减小，薄膜饱和磁化强度最高为427.43 emu/cm³。薄膜的矫顽力约为0。

Effect of Nitrogen Flow Ratio on Microstructure and Property of High-Entropy Alloy Films (CoCrFeNi)Nx Prepared by Magnetron Sputtering

High-entropy alloy films of (CoCrFeNi)N_x were prepared by direct current magnetron sputtering. The effect of nitrogen flow ratio on the microstructure, mechanical-, electrical- and magnetic- properties of the films were investigated. The results show that all dense (CoCrFeNi)N_x films prepared with different nitrogen flow ratio all consist of simple single face-centered cubic phase with (200) preferred orientation. With the increase of nitrogen flow ratio from 0 to 30%, both the hardness and elasticity modulus increase. The max values of the hardness and elasticity modulus are 14 GPa and 212 GPa, respectively. The resistivity of (CoCrFeNi)N_x films increases with the increasing nitrogen flow ratio, while the saturation magnetization and permeability decrease. The max value of the resistivity is 138 μΩ?cm, the highest saturation magnetization is 427.43 emu/cm³, and the coercivity remains around 0.