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Thermal Stability of Thin Film Corundum‐Type Solid Solutions of (Al1–xCrx)2O3 Synthesized Under Low‐Temperature Non‐Equilibrium Conditions |
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| Authors: | J. Ramm M. Ante H. Brändle A. Neels A. Dommann M. Döbeli |
| Affiliation: | 1. Oerlikon Balzers Coating AG, Iramali 18, LI‐9496 Balzers, Principality of Liechtenstein;2. Institute of Microtechnology, University of Neuchatel, Rue Jaquet‐Droz, CH‐2002 Neuchatel, Switzerland;3. Centre Suisse d'Electronique et de Microtechnique CSEM SA, Rue Jaquet‐Droz 1, CH‐2002 Neuchatel, Switzerland;4. Ion Beam Physics, Paul Scherrer Institute and ETH Zurich, Schafmattstrasse 20, CH‐8093 Zürich, Switzerland |
| Abstract: | |
| Keywords: | Alumina Chemical vapor deposition Corundum Physical vapour deposition |