|
|||||
|
|
Fabrication of Double‐Length‐Scale Patterns via Lithography,Block Copolymer Templating,and Electrodeposition |
|
| Authors: | Y.‐T. Tseng W.‐H. Tseng C.‐H. Lin R.‐M. Ho |
| Affiliation: | 1. Material and Chemical Research Laboratories, Industrial Technology Research Institute, Hsinchu 30013 (Taiwan);2. Department of Chemical Engineering, National Tsing Hua University, Hsinchu 30013 (Taiwan) |
| Abstract: | |
| Keywords: | Block copolymers Carbon nanotubes Lithography Self‐assembly Template‐directed assembly/synthesis |