Inside Front Cover: Direct Patterning,Conformal Coating,and Erbium Doping of Luminescent nc‐Si/SiO2 Thin Films from Solution Processable Hydrogen Silsesquioxane (Adv. Mater. 21/2007) |
| |
| Authors: | C. M. Hessel M. A. Summers A. Meldrum M. Malac J. G. C. Veinot |
| |
| Affiliation: | 1. Department of Chemistry, University of Alberta, Edmonton, Alberta, T6G 2G2 (Canada);2. Department of Electrical and Computer Engineering, University of Alberta, Edmonton, AB Canada, T6G 2V4 (Canada);3. Department of Physics, University of Alberta, Edmonton, Alberta, Canada, T6G 2J1 (Canada);4. National Institute for Nanotechnology, Edmonton, Alberta, Canada, T6G 2M9 (Canada) |
| |
| Abstract: | Patterned nanostructure arrays of luminescent, oxide‐embedded silicon nanocrystals (nc‐Si) are formed by reductively thermally processing e‐beam patterns of hydrogen silsesquioxane (HSQ). While traditionally employed as a negative type e‐beam resist, HSQ is shown to produce thin films, non‐flat conformal coatings, and sub‐10 nm structures that contain luminescent nc‐Si. The variety of morphologies (structures) that can be produced by this method highlights the versatility of HSQ as a nc‐Si precursor, report Jonathan Veinot and co‐workers from the University of Alberta, Canada on p. 3513. |
| |
| Keywords: | Coatings Doping Erbium Luminescence Nanocrystals, inorganic Patterning Silica Silicon |
|
|
