|
|||||
|
|
Well‐Aligned Nanocylinder Formation in Phase‐Separated Metal‐Silicide–Silicon and Metal‐Germanide–Germanium Systems |
|
| Authors: | N Yasui R Horie Y Ohashi K Tanji T Den |
| Affiliation: | Leading‐Edge Technology Development Headquarters, Canon Inc., 30‐2, Shimomaruko 3‐chome, Ohta‐ku, Tokyo, 146‐8501 (Japan) |
| Abstract: | |
| Keywords: | Germanium Nanostructures Silicon |